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USHIO America introduces the U-eLektron E-beam System at the RadTech UV& EB Technology Expo and Conference.
May 25, 2010
By: DAVID SAVASTANO
Editor, Ink World Magazine
USHIO America has introduced the U-eLektron E-beam System at the RadTech UV& EB Technology Expo and Conference. The U-eLektron, a bench top electron beam exposure system designed for R&D applications, is a 10 keV to 50 keV system withup to 200 μA of cathode current. The U-eLektron, which includes the electron beam gun, exposure chamber and controller/power supply, is priced starting at$17,000. An optional vacuum pump system is also available. “Our U-eLektron E-beam System has been des...
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